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Loại tài liệu: Tài liệu số - Journal Article
Thông tin trách nhiệm: Ao Liu; Huihui Zhu; Yong-Young Noh
Nhà Xuất Bản: Elservier
Năm Xuất Bản: 2019
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For decades, inorganic n-type metal-oxide semiconductors have attracted great interest across a wide range of applications due to their excellent electrical property, low cost, high optical transparency, and good ambient stability. The next attention has focused on the development of high-performance p-type semiconductors with comparable opto/electric properties to n-type counterparts. This paper provides a comprehensive overview of recent progress in solution-processed inorganic p-type semiconductors that can be applied as channel layers in thin-film transistors and complementary metal-oxide semiconductor-based integrated circuits. Wefirst introducernconventional p-type oxide semiconductors and review their achievements on related devices. Then, we pay a specific focus on emerging (pseudo)halide materials for realization of transparent, low-temperature and highperformance printable electronics and circuits.
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